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Fig. 1 | BMC Psychology

Fig. 1

From: Does depression drive technology overuse or vice-versa? a cross-lagged panel analysis of bidirectional relationships among Chinese university students

Fig. 1

Random-intercept cross-lagged panel model showing bidirectional relationships between total technology use and depression. This figure presents standardized path coefficients from a random-intercept cross-lagged panel model examining reciprocal relationships between total daily technology use and depression symptoms across four measurement waves. Solid arrows represent statistically significant paths (p <.05). Cross-lagged paths demonstrate significant bidirectional relationships (technology use to depression: β = 0.14, 95% CI [0.06–0.22], p = 0.001; depression to technology use: β = 0.11, 95% CI [0.03–0.19], p = 0.008). Model fit indices indicate excellent fit (CFI = 0.982, TLI = 0.970, RMSEA = 0.038, SRMR = 0.035)

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BMC Psychology

ISSN: 2050-7283

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